Thin-Film Deposition Services

We offer thin-film deposition of insulating and metal layers across diverse wafer substrates.

Our foundry services cover the full range from R&D and low-volume trials to high-volume manufacturing.

We also sell coated wafers; please inquire for specifications and availability.

  Deposition Method Film Type Supported Wafer Size / Notes
Insulating Films

Thermal Oxidation

Thermal Oxide Up to φ8 in.
PE-CVD(Low-Stress Deposition) TEOS Up to φ12 in.
SiO2 Up to φ8 in.
SiN Up to φ12 in.
SiON Up to φ8 in.
LP-CVD SiO2 Up to φ6 in.
SiN Up to φ6 in.
SiON Up to φ6 in.
Sputtering SiO2
Up to φ12 in.
Metal Films Sputtering Ti/Cu/Cr/Ni/Al/AlCu/Ta/TaN/
TiW/TiN/AlSi/Al2O3/
(Other film types can also be considered)
Up to φ12 in.
LP-CVD W Up to φ4 in.
poly-Si Up to φ6 in.